■ ■ PVD工藝
  真空鍍膜是在真空中将钛、金、石墨、水晶等金屬或非金屬、氣體等材料利用濺射、蒸發或離子鍍等技術, 在基材上形成薄膜的一種表面處理過程。與傳統化學鍍膜方法相比,真空鍍膜有很多優點:如對環境無污 染,是綠色環保工藝;對操作者無傷害;膜層牢固、緻密性好、抗腐蝕性強,膜厚均勻。 
  真空鍍膜技術中經常使用的方法主要有:蒸發鍍膜(包括電弧蒸發、電子槍蒸發、電阻絲蒸發等技術)、濺射鍍膜(包 括直流磁控濺射、中頻磁控濺射、射頻濺射等技術),這些方法統稱物理氣相沉積(Physical Vapor Deposition), 簡稱為PVD。與之對應的化學氣相沉積(Chemical Vapor Deposition)簡稱為CVD技術。行業内通常所說的“IP”(ion plating)離子鍍膜,是因為在PVD技術中各種氣體離子和金屬離子參與成膜過程并起到重要作用,為了強調離子的作 用,而統稱為離子鍍膜。



  Vacuum plating is a surface treatment process that sputtering, evaporation or ion-plating are used to make metals (such as titanium or gold) or non-metallic materials (graphite or crystal) deposit a coating on a metal substrate. Vacuum plating has more advantages compared with traditional chemical plating. It is environmentally friendly, non polluting, and not hazardous to operators. Vacuum plated coatings are stable, dense, uniform, and corrosion resistant.
  There are two vacuum plating methods. One is CVD (Chemical Vapor Deposition). The other is PVD (Physical Vapor Deposition). PVD includes evaporation plating (arc, electronic gun and resistance wire) and sputtering plating (DC magnetron Mid-frequency and RF). Gas ions and metal ions play an important role in coating formation. In order to emphasize the ion function, PVD is generally referred to as IP (Ion Plating).



Tritree is one of the leaders in the IP industry.